Tunnel diode
A tunnel diode or Esaki diode is a type of semiconductor diode that has effectively "negative resistance" due to the quantum mechanical effect called tunneling. It was invented in August 1957 by Leo Esaki when working at Tokyo Tsushin Kogyo, now known as Sony.[1][2] In 1973, Esaki received the Nobel Prize in Physics for experimental demonstration of the electron tunneling effect in semiconductors.[3] Robert Noyce independently devised the idea of a tunnel diode while working for William Shockley, but was discouraged from pursuing it.[4] Tunnel diodes were first manufactured by Sony in 1957,[5] followed by General Electric and other companies from about 1960, and are still made in low volume today.[6]
Tunnel diodes have a heavily doped positive-to-negative (P-N) junction that is about 10 nm (100 Å) wide. The heavy doping results in a broken band gap, where conduction band electron states on the N-side are more or less aligned with valence band hole states on the P-side. They are usually made from germanium, but can also be made from gallium arsenide and silicon materials.
Forward bias operation[edit]
Under normal forward bias operation, as voltage begins to increase, electrons at first tunnel through the very narrow P-N junction barrier and fill electron states in the conduction band on the N-side which become aligned with empty valence band hole states on the P-side of the P-N junction. As voltage increases further, these states become increasingly misaligned, and the current drops. This is called negative differential resistance because current decreases with increasing voltage. As voltage increases beyond a fixed transition point, the diode begins to operate as a normal diode, where electrons travel by conduction across the P-N junction, and no longer by tunneling through the P–N junction barrier. The most important operating region for a tunnel diode is the "negative resistance" region. Its graph is different from normal P-N junction diode.